ICP-MS综述Inductively Coupled Plasma Mass Spectrometry
The multielemental ultratrace detection capability of inductively
coupled plasma mass spectrometry (ICPMS) makes it a most
powerful technique. With each new version of ICPMS instrument,
which typically decreased in size, came lower detection limit (DL),
more user-friendly software to control it, and better accessibility
to its different components for maintenance. These improvements
facilitated its use by more people, which in turn increased sales
worldwide. However, ICPMS is a black box for many people,
which can be dangerous in terms of the reliability of the results
obtained by these people if they are not appropriately warned
about the remaining shortcomings of the technique (such as its
susceptibility to matrix effects). Unless these users can attend
workshops, conferences or read the literature, then their sole
source of training will be their instrument suppliers, who understandably
provide only a general introduction, as they are in the
business of selling instruments (and then providing technical
support), not teaching people. That is likely why numerous people
qualify ICPMS of a mature, routine technique. Since the last
fundamental review was published in Analytical Chemistry (1),
some 2000 papers containing the subject “inductively coupled
plasma mass spectrometry” were published according to SciFinder
Scholar 2007, the majority of which were applications. Unfortunately,
the number of fundamental studies declined, despite the
remaining shortcomings that jeopardize the robustness of ICPMS
for chemical analysis. Until these issues are resolved, fundamental
reviews will continue to be warranted. The purpose of this paper
is to critically review significant developments in ICPMS from
October 2005 to October 2007 (exclusively). As it must be limited
to a maximum of about 250 references, this review is not meant
to be comprehensive. Nonetheless, several references to relevant
books and review papers have been included to provide a more
comprehensive coverage.
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