热电X系列ICP-MS原理培训

仪器资料 · 发表于 2017-9-25 16:12:04

热电X系列ICP-MS原理培训

Contents
1. Lecture 1 :
ICP-MS and the
X Series ICP-MS 5
Characteristics of Quadrupole ICP-MS 8
Sample Introduction 10
Focusing / Optimization 19
Mass Filtration 20
Detection 36
The X Series ICP-MS 40
2. Lecture 2 :
PlasmaLab 49
Overview 51
Instrument 53
Technician 55
Experiment 56
3. Lecture 3 : Analytical
Method Development 65
Sample Dissolution 67
Sample Preparation 68
Standard Preparation 69
Peak Jumping versus Scanning 73
Matrix Considerations 77
Internal Standard Selection 80
Calibration Strategies 83
Dealing with Interferences 87
Application Areas 89
Minimizing Contamination in the Laboratory 96
Causes of Interferences 98
Correction Equations 103
Benefits of Performance Options 105
Working with PlasmaScreen Plus 107
Working with CCT 109
5. Lecture 5 :
Plasma Screen Applications 113
X Series Features 115
ISIS Options 116
Cool PlasmaScreen 117
Hot PlasmaScreen 121
Tuning Conditions 123
Cool Mode Calibration 124
Hot Mode Calibration 125
Sample Handling 126
Enhanced Sensitivity 127