NMR Chemical Shifts of Trace Impurities Common aboratory Solvents

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NMR Chemical Shifts of Trace Impurities Common aboratory Solvents

Gregory R. Fulmer,*,† Alexander J. M. Miller,‡ Nathaniel H. Sherden,‡
Hugo E. Gottlieb,§ Abraham Nudelman,§ Brian M. Stoltz,‡ John E. Bercaw,‡ and
Karen I. Goldberg†
†Department of Chemistry, University of Washington, Box 351700, Seattle, Washington 98195-1700,
‡Arnold and Mabel Beckman Laboratories of Chemical Synthesis and Caltech Center for Catalysis and
Chemical Synthesis, Division of Chemistry and Chemical Engineering, California Institute of
Technology, Pasadena, California 91125, and §Department of Chemistry, Bar Ilan University,
Ramat Gan 52900, Israel
Received February 11, 2010
Tables of 1H and 13C NMR chemical shifts have been compiled for common organic compounds
often used as reagents or found as products or contaminants in deuterated organic solvents. Building
upon the work of Gottlieb, Kotlyar, and Nudelman in the Journal of Organic Chemistry, signals for
common impurities are now reported in additional NMR solvents (tetrahydrofuran-d8, toluene-d8,
dichloromethane-d2, chlorobenzene-d5, and 2,2,2-trifluoroethanol-d3) which are frequently used in
organometallic laboratories. Chemical shifts for other organics which are often used as reagents or
internal standards or are found as products in organometallic chemistry are also reported for all the
listed solvents.

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